Microphotomasks for ASML Equipment
Framework agreement for the supply of high-precision microphotomasks required for ASML XT1060K and XT400M equipment. Secure the components for your semiconductor manufacturing.
CONTRACTING AUTHORITY
Name
Commissariat à l'énergie atomique et aux énergies alternatives
City
Grenoble
Country
FR
CLASSIFICATION
Procedure Type
Open Procedure
Contract Type
Supplies
Main CPV
31700000, Electronic, electromechanical and electrotechnical supplies.
LOTS (2)
Microphotomaschinen für ASML XT1060K
Microphotomaschinen für ASML XT400M
ADDITIONAL DETAILS
EU Funded
Yes
Electronic Submission
Required
Legal Basis
32014L0024
DEADLINES & TIMELINE
Submission Deadline
30 days remaining(LOT-0001)
Published