Electron Beam Lithography Tool and Scanning Electron Microscope for UPV Pilot Line
Supply, installation, and commissioning of an Electron Beam Lithography tool (UPV04) for up to 8-inch wafers and a Scanning Electron Microscope (UPV13) for the UPV Pilot Line: The electron beam lithography tool exposes patterns on sensitive resists using a focused and scanned electron beam, writes nanometer-resolution features according to digital design, and is dedicated to nanofabrication patterning, especially for masks and structures in photonics, semiconductors, and nanotechnology. The scanning electron microscope is for surface inspection using a focused electron beam, delivers nanometer-resolution images, provides morphological and surface contrast information, as well as contrast related to composition or atomic number, and is used for metrology, inspection, process validation, and quality control. The equipment is intended for research and development work to improve and develop new pilot lines for semiconductor technologies.
CONTRACTING AUTHORITY
Name
Rectorado de la Universitat Politècnica de València
City
Valencia
Country
ES
CLASSIFICATION
Procedure Type
Open Procedure
Contract Type
Supplies
Main CPV
31712110, Electronic integrated circuits and microassemblies.
ADDITIONAL DETAILS
EU Funded
Yes
Electronic Submission
Required
Legal Basis
32014L0024
DEADLINES & TIMELINE
Submission Deadline
57 days remaining(LOT-0000)
Published