Activeted-409508-2026
Electron Beam Lithography System for University of Twente
The University of Twente seeks a high-resolution, high-speed Electron Beam system for pattern definition on substrates up to 200mm. This versatile system will serve academic and industrial users across various nano-applications.
€3,500,000
View original sourceCONTRACTING AUTHORITY
Name
Universiteit Twente
City
Enschede
Country
NL
CLASSIFICATION
Procedure Type
Open Procedure
Contract Type
Supplies
Main CPV
38000000, Laboratory, optical and precision equipments (excl. glasses).
Other CPV
38341100, Electron-beam recorders.
ADDITIONAL DETAILS
EU Funded
Yes
Electronic Submission
allowed
Legal Basis
32014L0024
DEADLINES & TIMELINE
Submission Deadline
57 days remaining(LOT-0000)
Published