Atomic Layer Deposition (ALD) System for Heidelberg University

Notice title: Vergabeverfahren zur Lieferung einer Atomlagenabscheidungsanlage (ALD)

Delivery of an Atomic Layer Deposition (ALD) system: ready-for-operation handover including functional test, instruction, and acceptance of a system for both thermal and plasma-enhanced atomic layer deposition of high-precision thin films on three-dimensionally pre-structured and planar substrates with controlled layer thicknesses in the nanometer range. The system must enable the deposition of high-quality superconducting films (especially niobium nitride), dielectric thin films, magnetic materials, and high-k dielectrics. It must be equipped with precise in-situ layer thickness monitoring. The service includes the supply of a new device, timely delivery 'free kerbside including unloading', functional test, instruction, and commissioning, on-site acceptance, and on-site training (3 days of 8 hours each) for 2 university employees. Maximum budget: 1,039,000.00 EUR (including VAT, customs duties, and any discounts).

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