Delivery of a Gas Phase Deposition System for Heidelberg University

Delivery and ready-for-operation handover of a system for plasma-enhanced chemical vapor deposition (PECVD) with an inductively coupled plasma source (ICP): The system is for producing high-quality material films with precisely defined layer thicknesses in the nanometer-micrometer range, and for depositing dielectric thin films with controllable optical properties and precisely controllable layer thicknesses via in-situ monitoring. It should enable the deposition of dielectric layers for optical passivation, optical waveguides, multilayer systems, and as hard masks for high-resolution lithography processes, as well as the optimized deposition of silicon dioxide, silicon nitride, amorphous silicon, and diamond-like carbon layers. The service includes the offer and delivery of a new device or new goods, timely delivery and complete installation at the point of use, disposal of packaging and superfluous components, functional test or demonstration, instruction and commissioning, on-site acceptance of the device, and on-site training (3 days of 8 hours each) for 2 employees of Heidelberg University. The maximum financial budget is 806,000.00 EUR (including VAT or comparable, customs duties, and any discounts).

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