Plasma enhanced chemical vapour deposition tool
Notice title: Plasma enhanced chemical vapour deposition tool
Status
Active
Submission Deadline
166 days remaining
Contracting authority
TEKNOLOGIAN TUTKIMUSKESKUS VTT OY13 more open tenders view
Location
Finland
Procedure
Negotiated procedure without prior call for competition · Supplies
Category
Laboratory, optical and precision equipments (excl. glasses).
Published
Reference
hilma-EF-56248
Source
Plasma-enhanced automated cassette to cassette chemical vapor deposition (PECVD) system for deposition of dielectric thin films (SiO#, SiN, TEOS, SiON, a Si) for research and pilot line use in the VTT Micronova cleanroom.
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Additional details
Electronic Submission
Required
Legal Basis
32014L0024