Plasma-Enhanced Atomic Layer Deposition (PE-ALD) System
Notice title: ALD-Anlage
Status
Expired
Submission Deadline
Contracting authority
Leibniz-Institut für Photonische Technologien e.V.
Location
Jena, Germany
Procedure
Open Procedure · Supplies
Category
Laboratory, optical and precision equipments (excl. glasses).
Published
Reference
ted-589605-2026
Source
Delivery of a Plasma-Enhanced Atomic Layer Deposition (PE-ALD) system for thin-film deposition on substrates ranging from single chip format (5 x 5 mm²) up to at least 150 mm wafers. The system must enable reproducible deposition processes for various conductive, semiconducting, and dielectric layers, also without vacuum interruption (multi-layers). A control PC with monitor, keyboard, mouse, software licenses, and Windows 11 operating system is to be supplied.
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Tender documents
- Portal — LOT-0001NON-RESTRICTED-DOCUMENT
- TED HTML — 589605-2026HTML
- TED PDF — 589605-2026PDF
- TED XML — 589605-2026XML
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Additional details
EU Funded
Yes
Suitable for SMEs
No
Electronic Submission
Required
Legal Basis
32014L0024