X-ray Diffraction Equipment for Material Characterization

X-ray diffraction equipment for non-destructive characterization of synthesized materials: Determination of crystal structure and microstructural parameters. It allows the analysis of a wide range of materials (thin films, powders, liquid suspensions, membranes) for applications such as phase identification and analysis, Rietveld refinement, microstructural analysis, reflectivity measurements, reciprocal space mapping, and residual stress determination. The equipment is part of a 'Semiconductor Device Microfabrication' prototyping line within Project PNTS – 'National Semiconductor Technologies Platform'. It must ensure high-resolution measurements, flexibility in experimental configuration, detection systems, analysis software, and safe operation mechanisms.

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