FIB-SEM Dual-Beam System
FIB-SEM Dual-Beam System: 1 unit field-free (without immersion optics) focused ion beam system combined with a high-resolution scanning electron microscope for patterning, nanostructuring, and cross-sectional and surface analysis of primarily III/V semiconductors, LNOI, polymers, resists, and semiconductor technology process products. Programmable and automated routines should be configurable. Options: advanced training course for 15 days (2 people), availability to be confirmed as required; 1 gas injection system with additional components, to be specified in the tender; software module for importing KLAF files.
CONTRACTING AUTHORITY
CLASSIFICATION
Procedure Type
neg-w-call
Contract Type
Supplies
Main CPV
42900000, Miscellaneous general and special-purpose machinery.
ADDITIONAL DETAILS
EU Funded
Yes
Suitable for SMEs
Yes
Electronic Submission
allowed
Legal Basis
32014L0024
DEADLINES & TIMELINE
Submission Deadline
14 days remaining(LOT-0000)
Published